[C-6-1] High-modulus Porous MSQ Films for Cu/Low-k Integration (keff < 2.7)
K. Misawa, S. Sone, H.J. Shin, K. Inukai, Y. Sudo, S. Kondo, B.U. Yoon, S. Tokitoh, K. Yoneda, T. Yoshie, N. Ohashi, N. Kobayashi
(1.Research Dept. 2, Semiconductor Leading Edge Technologies, Inc. (Selete))
https://doi.org/10.7567/SSDM.2003.C-6-1