[D-10-2] Theoretical Analysis of Oxygen Diffusion in monoclinic HfO2

Minoru Ikeda、Georg Kresse、Toshihide Nabatame、Akira Toriumi (1.MIRAI Project, Association of Super-Advanced Electronics Technologies (ASET)、2.Institut fur Materialphysik, Univeisitat Wien、3.MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technologies (AIST)、4.Department of Materials Science School of Engineering, University of Tokyo)

https://doi.org/10.7567/SSDM.2003.D-10-2