Nondestructive Characterization of Pore Size Distributions in Porous Low-k Films by in-situ Spectroscopic Ellipsometry in Vapor Cell

Chie Negoro; Nobuhiro Hata; Takamaro Kikkawa

doi:https://doi.org/10.7567/SSDM.2003.D-2-1

[D-2-1] Nondestructive Characterization of Pore Size Distributions in Porous Low-k Films by in-situ Spectroscopic Ellipsometry in Vapor Cell

Chie Negoro, Nobuhiro Hata, Takamaro Kikkawa (1.Advanced Semiconductor Research Center, National Institute of Advanced Industrial Science and Technology, 2.MIRAI Project, Advanced Semiconductor Research Center, AIST, 3.Research Center for Nanodevices and Systems, Hiroshima University)

https://doi.org/10.7567/SSDM.2003.D-2-1

2003 International Conference on Solid State Devices and Materials

[D-2-1] Nondestructive Characterization of Pore Size Distributions in Porous Low-k Films by in-situ Spectroscopic Ellipsometry in Vapor Cell