[D-9-2] Chemical Structures of HfO2/Si Interfacial Transition Layer

H. Nohira, Y. Takata, K. Kobayashi, M. B. Seman, S. Joumori, K. Nakajima, M. Suzuki, K. Kimura, Y. Sugita, O. Nakatsuka, A. Sakai, S. Zaima, T. Ishikawa, S. Shin, T. Hattori (1.Musashi Institute of Technology, 2.RIKEN/SPring-8, 3.JASRI/SPring-8, 4.Graduate School of Engineering, Kyoto University, 5.Fujitsu Ltd., Akiruno Technology Center, 6.Graduate School of Engineering, Nagoya University)

https://doi.org/10.7567/SSDM.2003.D-9-2