[D-9-3] Pulsed-source MOCVD HfO2 ultrathin film growth optimized by in situ ellipsometry monitoring

Yoshishige Tsuchiya、Masato Endoh、Shunri Oda (1.Tokyo Institute of Technology, Research Center for Quantum Effect Electronics)

https://doi.org/10.7567/SSDM.2003.D-9-3