High-Quality Two-Dimensional Electron Gas at Large Scale GaN/AlGaN Wafer Interface Prepared by Mass Production MOCVD Systems

Syoji Yamada; Takashi Ohnishi; Tomoyasu Kakegawa; Masashi Akabori; Toshikazu Suzuki; Hiroshi Sugiura; Fumihiko Nakamura; Eiichi Yamaguchi; Hiroji Kawai

doi:https://doi.org/10.7567/SSDM.2003.F-1-7

[F-1-7] High-Quality Two-Dimensional Electron Gas at Large Scale GaN/AlGaN Wafer Interface Prepared by Mass Production MOCVD Systems

Syoji Yamada, Takashi Ohnishi, Tomoyasu Kakegawa, Masashi Akabori, Toshikazu Suzuki, Hiroshi Sugiura, Fumihiko Nakamura, Eiichi Yamaguchi, Hiroji Kawai (1.Center for Nano Materials and Technology, JAIST, 2.Powdec K.K)

https://doi.org/10.7567/SSDM.2003.F-1-7

2003 International Conference on Solid State Devices and Materials

[F-1-7] High-Quality Two-Dimensional Electron Gas at Large Scale GaN/AlGaN Wafer Interface Prepared by Mass Production MOCVD Systems