High-Quality Two-Dimensional Electron Gas at Large Scale GaN/AlGaN Wafer Interface Prepared by Mass Production MOCVD Systems

Syoji Yamada; Takashi Ohnishi; Tomoyasu Kakegawa; Masashi Akabori; Toshikazu Suzuki; Hiroshi Sugiura; Fumihiko Nakamura; Eiichi Yamaguchi; Hiroji Kawai

doi:https://doi.org/10.7567/SSDM.2003.F-1-7

2003 International Conference on Solid State Devices and Materials

2003年9月16日〜 2003年9月18日
Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[F-1-7] High-Quality Two-Dimensional Electron Gas at Large Scale GaN/AlGaN Wafer Interface Prepared by Mass Production MOCVD Systems

Syoji Yamada、Takashi Ohnishi、Tomoyasu Kakegawa、Masashi Akabori、Toshikazu Suzuki、Hiroshi Sugiura、Fumihiko Nakamura、Eiichi Yamaguchi、Hiroji Kawai (1.Center for Nano Materials and Technology, JAIST、2.Powdec K.K)

https://doi.org/10.7567/SSDM.2003.F-1-7

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