The Impact of Technology Parameters and Scaling on the Programming Performance and Drain Disturb in CHISEL Flash EEPROMs

Deleep R. Nair; Nihar R. Mohapatra; S. Mahapatra; S. Shukuri

doi:https://doi.org/10.7567/SSDM.2003.P10-3

2003 International Conference on Solid State Devices and Materials

Sep 16, 2003 - Sep 18, 2003
Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan

[P10-3] The Impact of Technology Parameters and Scaling on the Programming Performance and Drain Disturb in CHISEL Flash EEPROMs

Deleep R. Nair, Nihar R. Mohapatra, S. Mahapatra, S. Shukuri (1.Department of Electrical Engineering, Indian Institute of Technology, 2.Semiconductor and Integrated Circuits Group, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.2003.P10-3

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