[P10-9] Highly Anisotropic and Corrosion-less PtMn Etching using Negative Ions in Pulse-Time-Modulated Chlorine Plasma

S. Kumagai、T. Shiraiwa、S. Samukawa (1.Institute of Fluid Science, Tohoku University、2.Micro Systems Network Company, Sony Corporation)

https://doi.org/10.7567/SSDM.2003.P10-9