[P11-3] Two-Step Electrode Self-Aligned Process of InP-based RTDs for Highly Integrated RTD/HEMT Circuits

Toshihiro Ohki、Naoya Okamoto、Tsuyoshi Takahashi、Kozo Makiyama、Kenji Imanishi、Naoki Hara (1.Fujitsu Laboratories Ltd.)

https://doi.org/10.7567/SSDM.2003.P11-3