[P3-2] Very High Reliability of Ultrathin Silicon Nitride Gate Dielectric Film for sub-100nm Generation
Masanori Komura, Masaaki Higuchi, Weitao Cheng, Ichiro Ohshima, Akinobu Teramoto, Masaki Hirayama, Shigetoshi Sugawa, Tadahiro Ohmi
(1.Graduate School of Engineering, Tohoku University, 2.The New Industry Creation Hatchery Center (NICHe), Tohoku University)
https://doi.org/10.7567/SSDM.2003.P3-2
