[P3-2] Very High Reliability of Ultrathin Silicon Nitride Gate Dielectric Film for sub-100nm Generation
Masanori Komura、Masaaki Higuchi、Weitao Cheng、Ichiro Ohshima、Akinobu Teramoto、Masaki Hirayama、Shigetoshi Sugawa、Tadahiro Ohmi
(1.Graduate School of Engineering, Tohoku University、2.The New Industry Creation Hatchery Center (NICHe), Tohoku University)
https://doi.org/10.7567/SSDM.2003.P3-2
