[P4-13] Wet Etching Characteristics of both As-deposited and Annealed Al2O3 and HfAlOx Films

Tomoaki Nishimura, Ronald Kuse, Koji Tominaga, Toshihide Nabatame, Akira Toriumi (1.MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 2.MIRAI Project, Association of Super-Advanced Electronics Technology (ASET), 3.Department of Materials Science, School of Engineering, The University of Tokyo)

https://doi.org/10.7567/SSDM.2003.P4-13