[P4-18] Failure Mechanism of Nano-crystalline VN barrier in Cu/VN/SiO2/Si system

Takaomi Itoi、Osamu Yanada、Kazumi Satoh、M. B. Takeyama、Atsushi Noya (1.Kitami Institute of Technology, Dept. Electrical and Electronic Engineering.、2.Chiba University, Faculty of Engineering.、3.SEC Ltd.、4.Hitachi Kokusai Electric Inc.)

https://doi.org/10.7567/SSDM.2003.P4-18