[P4-6] Influence of structural variation of Ni silicide thin films on electrical property for contact materials

Kazuya Okubo、Yoshinori Tsuchiya、Osamu Nakatsuka、Akira Sakai、Shigeaki Zaima、Yukio Yasuda (1.Graduate School of Engineering, Nagoya University、2.Center for Integrated Research in Science and Engineering, Nagoya University、3.Center for Cooperative Research in Advanced Science and Technology, Nagoya University)

https://doi.org/10.7567/SSDM.2003.P4-6