The Japan Society of Applied Physics

[A-2-1] Fully Silicided NiSi Gates on HfSiON Gate Dielectrics for Low Power Application

Kenzo Manabe, Kensuke Takahashi, Taeko Ikarashi, Ayuka Morioka, Heiji Watanabe, Takuya Yoshihara, Toru Tatsumi (1.System Devices Research Laboratories, NEC Corporation)

https://doi.org/10.7567/SSDM.2004.A-2-1