Successful CMOS Operation of Dopant-Segregation Schottky Barrier Transistors (DS-SBTs)

A. Kinoshita; Y. Tsuchiya; A. Yagishita; K. Uchida; J. Koga

doi:https://doi.org/10.7567/SSDM.2004.A-5-1

[A-5-1] Successful CMOS Operation of Dopant-Segregation Schottky Barrier Transistors (DS-SBTs)

A. Kinoshita、Y. Tsuchiya、A. Yagishita、K. Uchida、J. Koga (1.Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation、2.Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2004.A-5-1

2004 International Conference on Solid State Devices and Materials

[A-5-1] Successful CMOS Operation of Dopant-Segregation Schottky Barrier Transistors (DS-SBTs)