[A-7-1] Investigation of Degradation model for Ultra -thin Gate Dielectrics

Hiroko Mori、Hideo Ehara、Naoyoshi Tamura、Chioko Kaneta、Hideya Matsuyama、Ken Shono (1.FUJITSU LSI Quality Assurance Div.、2.FUJITSU Laboratories Ltd.)

https://doi.org/10.7567/SSDM.2004.A-7-1