[B-2-4] Recovery of Process-induced Damages of Porous Silica Low- k Films by TMCTS Vapor Annealing

Y. Oku、N. Fujii、Y. Seino、Y. Takasu、H. Takahashi、Y. Sonoda、T. Goto、H. Miyoshi、S. Takada、T. Kikkawa (1.MIRAI, Association of Super-Advanced Electronics Technologies (ASET)、2.MIRAI, Advanced Semiconductor Research Center, National Institute of Advanced Industrial Science and Technology、3.Advanced Semiconductor Research Center, National Institute of Advanced Industrial Science and Technology、4.Research Center for Nanodevices and Systems, Hiroshima University)

https://doi.org/10.7567/SSDM.2004.B-2-4