[B-3-2] Formation of Nickel Self-Aligned Silicide by Using Cyclic Deposition Method

Koichi Terashima, Yoshinao Miura, Nobuyuki Ikarashi, Makiko Oshida, Kenzo Manabe, Takuya Yoshihara, Masayasu Tanaka, Hitoshi Wakabayashi (1.System Devices Research Laboratories, NEC Corporation, 2.R&D Support Center, NEC Corporation)

https://doi.org/10.7567/SSDM.2004.B-3-2