Top-Surface Aluminized and Nitrided Hafnium Oxide Using Synthesis of Thin AlN and HfO2 Stacked Layer

Chang Seo Park; Byung Jin Cho; Lei Jun Tang; Wiede Wang; Dim-Lee Kwong

doi:https://doi.org/10.7567/SSDM.2004.B-8-3

[B-8-3] Top-Surface Aluminized and Nitrided Hafnium Oxide Using Synthesis of Thin AlN and HfO2 Stacked Layer

Chang Seo Park, Byung Jin Cho, Lei Jun Tang, Wiede Wang, Dim-Lee Kwong (1.Silicon Nano Device Lab, Dept. of Electrical & Computer Engineering, National University of Singapore, 2.Institute of Microelectronics, 3.Institute of Materials Research Engineering, 4.Department of ECE, The University of Texas)

https://doi.org/10.7567/SSDM.2004.B-8-3

2004 International Conference on Solid State Devices and Materials

[B-8-3] Top-Surface Aluminized and Nitrided Hafnium Oxide Using Synthesis of Thin AlN and HfO2 Stacked Layer