Top-Surface Aluminized and Nitrided Hafnium Oxide Using Synthesis of Thin AlN and HfO2 Stacked Layer

Chang Seo Park; Byung Jin Cho; Lei Jun Tang; Wiede Wang; Dim-Lee Kwong

doi:https://doi.org/10.7567/SSDM.2004.B-8-3

[B-8-3] Top-Surface Aluminized and Nitrided Hafnium Oxide Using Synthesis of Thin AlN and HfO2 Stacked Layer

Chang Seo Park、Byung Jin Cho、Lei Jun Tang、Wiede Wang、Dim-Lee Kwong (1.Silicon Nano Device Lab, Dept. of Electrical & Computer Engineering, National University of Singapore、2.Institute of Microelectronics、3.Institute of Materials Research Engineering、4.Department of ECE, The University of Texas)

https://doi.org/10.7567/SSDM.2004.B-8-3

2004 International Conference on Solid State Devices and Materials

[B-8-3] Top-Surface Aluminized and Nitrided Hafnium Oxide Using Synthesis of Thin AlN and HfO2 Stacked Layer