[B-9-4] A New Divided Deposition Method of TiN Thin Films for MIM Capacitor Applications

Shinsuke Sakashita、Takeshi Hayashi、Tomonori Okudaira、Kazutoshi Wakao、Junichi Tsuchimoto、Kenichi Mori、Kiyoteru Kobayashi、Masahiro Yoneda (1.Process Development Dept., Process Technology Development Div., Production and Technology Unit, Renesas Technology Corporation)

https://doi.org/10.7567/SSDM.2004.B-9-4