[C-10-2] Generalized Model of Oxidation Mechanism at HfO2/Si Interface with Post-Deposition Annealing

Haruka Shimizu, Koji Kita, Kentaro Kyuno, Akira Toriumi (1.Department of Materials Science, School of Engineering, The University of Tokyo)

https://doi.org/10.7567/SSDM.2004.C-10-2