[C-3-2] Trapping/de-trapping gate bias dependence of Hf-silicate dielectrics with poly and TiN gate electrode

Jang Hoan Sim, Rino Choi, Byoung Hun Lee, Chadwin Young, Peter Zeitzoff, Gennadi Bersuker (1.International SEMATECH, 2.IBM assignee)

https://doi.org/10.7567/SSDM.2004.C-3-2