[C-8-3] Development of Simulation Method for Buried Oxide Formation of SIMOX Structure During Post-Implantation Thermal Annealing

Motoi Nakao、Koichi Sudoh、Hirofumi Iikawa、Hiroshi Iwasaki、Katsutoshi Izumi (1.Research Institute for Advanced Science and Technology, Osaka Prefecture Univ.、2.Institute of Science and Industrial Research, Osaka Univ.)

https://doi.org/10.7567/SSDM.2004.C-8-3