[C-8-3] Development of Simulation Method for Buried Oxide Formation of SIMOX Structure During Post-Implantation Thermal Annealing

Motoi Nakao, Koichi Sudoh, Hirofumi Iikawa, Hiroshi Iwasaki, Katsutoshi Izumi (1.Research Institute for Advanced Science and Technology, Osaka Prefecture Univ., 2.Institute of Science and Industrial Research, Osaka Univ.)

https://doi.org/10.7567/SSDM.2004.C-8-3