[C-9-1] Difference between O2 and N2 Annealing Effects on CVD-SiO2 Film Quality Studied by the Time-Dependent OCP Measurement

Koji Kita、Kentaro Kyuno、Akira Toriumi (1.Department of Materials Science, School of Engineering, The University of Tokyo)

https://doi.org/10.7567/SSDM.2004.C-9-1