[C-9-4] Evaluation of Electronic Defect States at Poly-Si/HfO2 interface by Photoelectron Yield Spectroscopy
Masashi Sugimura, Akio Ohta, Hiroshi Nakagawa, Taku Shibaguchi, Seiichiro Higashi, Seiichi Miyazaki
(1.Graduate School of Advanced Sciences of Matter, Hiroshima University)
https://doi.org/10.7567/SSDM.2004.C-9-4
