[C-9-4] Evaluation of Electronic Defect States at Poly-Si/HfO2 interface by Photoelectron Yield Spectroscopy

Masashi Sugimura、Akio Ohta、Hiroshi Nakagawa、Taku Shibaguchi、Seiichiro Higashi、Seiichi Miyazaki (1.Graduate School of Advanced Sciences of Matter, Hiroshima University)

https://doi.org/10.7567/SSDM.2004.C-9-4