[G-10-4] Precise Thermal Characterization of Confined Nanocrystalline Silicon By a 3ω Method

Takashi Kihara、Toshihiro Harada、Nobuyoshi Koshida (1.Research & Development Headquarters, Yamatake Corporation、2.Department of Electrical and Electronic Engineering, Faculty of Technology, Tokyo University of Agriculture and Technology)

https://doi.org/10.7567/SSDM.2004.G-10-4