[P3-10] Work function control of Al-Ni alloy for metal gate application

T. Matsukawa、C. Yasumuro、H. Yamauchi、S. Kanemaru、M. Masahara、K. Endo、E. Suzuki、J. Itoh (1.Nanoelectronics Research Institute, AIST)

https://doi.org/10.7567/SSDM.2004.P3-10