[P3-10] Work function control of Al-Ni alloy for metal gate application

T. Matsukawa, C. Yasumuro, H. Yamauchi, S. Kanemaru, M. Masahara, K. Endo, E. Suzuki, J. Itoh (1.Nanoelectronics Research Institute, AIST)

https://doi.org/10.7567/SSDM.2004.P3-10