Quantum Chemical Molecular Dynamics Simulation of Boron Diffusion and Si Implantation into Silicon Surface

Tsuyoshi Masuda; Hideyuki Tsuboi; Michihisa Koyama; Momoji Kubo; Akira Miyamoto

doi:https://doi.org/10.7567/SSDM.2004.P3-12

[P3-12] Quantum Chemical Molecular Dynamics Simulation of Boron Diffusion and Si Implantation into Silicon Surface

Tsuyoshi Masuda、Hideyuki Tsuboi、Michihisa Koyama、Momoji Kubo、Akira Miyamoto (1.Department of Applied Chemistry, Tohoku University、2.New Industry Creation Hatchery Center, Tohoku University、3.JST-PRESTO)

https://doi.org/10.7567/SSDM.2004.P3-12

2004 International Conference on Solid State Devices and Materials

[P3-12] Quantum Chemical Molecular Dynamics Simulation of Boron Diffusion and Si Implantation into Silicon Surface