[P3-13] The mechanical properties of hydrophobic nanoporous silica low-k films investigated by utilizing X-ray reflectivity technology

C. W. Yen, A. T. Cho, H. Y. Hwang, F. M. Pan, J. Y. Chen, K. J. Chao (1.National Nano Device Laboratories, 2.Department of Chemistry, National Tsinghua University, 3.Department of Materials Science and Engineering, National Chiao Tung University)

https://doi.org/10.7567/SSDM.2004.P3-13