Theoretical Study of Chemical Mechanical Polishing of SiO2 Surface

Arivazhagan Rajendran; Yasufumi Takahashi; Hideyuki Tsuboi; Michihisa Koyama; Momoji Kubo; Akira Miyamoto

doi:https://doi.org/10.7567/SSDM.2004.P3-14

[P3-14] Theoretical Study of Chemical Mechanical Polishing of SiO2 Surface

Arivazhagan Rajendran、Yasufumi Takahashi、Hideyuki Tsuboi、Michihisa Koyama、Momoji Kubo、Akira Miyamoto (1.Department of Applied Chemistry, Graduate School of Engineering, Tohoku University、2.JST-PRESTO、3.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.2004.P3-14

2004 International Conference on Solid State Devices and Materials

[P3-14] Theoretical Study of Chemical Mechanical Polishing of SiO2 Surface