[P3-21L] Electrical characteristics of crystalline HfO2 high-κ dielectric films deposited on crystalline γ-Al2O3 films

Takayuki Okada、Mohammad Shahjahan、Kazuaki Sawada、Makoto Ishida (1.Toyohashi University of Technology, Department of Electrical and Electronic Engineering、2.Rajshahi University, Department of Physics)

https://doi.org/10.7567/SSDM.2004.P3-21L