[P3-21L] Electrical characteristics of crystalline HfO2 high-κ dielectric films deposited on crystalline γ-Al2O3 films

Takayuki Okada, Mohammad Shahjahan, Kazuaki Sawada, Makoto Ishida (1.Toyohashi University of Technology, Department of Electrical and Electronic Engineering, 2.Rajshahi University, Department of Physics)

https://doi.org/10.7567/SSDM.2004.P3-21L