[P3-23L] TDS measurement for low-k porous silica films incorporated with ethylene groups

Yasutaka Uchida、Yoshiyuki Maruya、Tomohiro Katoh、Yoshito Ito、Koichi Ishida (1.Teikyo Univ. of Sci & Tech, Dept of Media Science)

https://doi.org/10.7567/SSDM.2004.P3-23L