[P3-9] Adsorption Behavior of Various Fluorocarbon Gases on the Silicon Wafer Surface

Atsushi Hidaka、Satoru Yamashita、Takeyoshi Kato、Yasuyuki Shirai、Tadahiro Ohmi (1.University of Tohoku, Department of Electronic Engineering, Graduate School of Engineering、2.University of Tohoku, New Industry Creation Hatchery Center (NICHe))

https://doi.org/10.7567/SSDM.2004.P3-9