[P8-3] Nanoimprint Lithography Using Novolak Photoresist and Soft Mold at Room Temperature

Takahiro Numai, Takeshi Koide, Takashi Minemoto, Hideyuki Takakura, Yoshihiro Hamakawa (1.Ritsumeikan University, College of Science and Engineering)

https://doi.org/10.7567/SSDM.2004.P8-3