[P8-3] Nanoimprint Lithography Using Novolak Photoresist and Soft Mold at Room Temperature

Takahiro Numai、Takeshi Koide、Takashi Minemoto、Hideyuki Takakura、Yoshihiro Hamakawa (1.Ritsumeikan University, College of Science and Engineering)

https://doi.org/10.7567/SSDM.2004.P8-3