The Japan Society of Applied Physics

[A-2-2] Exact Trap Level Estimation of HfSiON Films with Various Atomic Compositions

Masahiro Koike、Tsunehiro Ino、Yuuichi Kamimuta、Yuichiro Mitani、Akira Nishiyama (1.Advanced LSI Technology Laboratory, Corporate Research&Development Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2005.A-2-2