Exact Trap Level Estimation of HfSiON Films with Various Atomic Compositions

Masahiro Koike; Tsunehiro Ino; Yuuichi Kamimuta; Yuichiro Mitani; Akira Nishiyama

doi:https://doi.org/10.7567/SSDM.2005.A-2-2

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜 2005年9月15日
International Conference Center Kobe, Kobe, Japan

[A-2-2] Exact Trap Level Estimation of HfSiON Films with Various Atomic Compositions

Masahiro Koike、Tsunehiro Ino、Yuuichi Kamimuta、Yuichiro Mitani、Akira Nishiyama (1.Advanced LSI Technology Laboratory, Corporate Research&Development Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2005.A-2-2

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