[A-2-3] Influences of initial bulk traps on Negative Bias Temperature Instability of HfSiON

Izumi Hirano, Takeshi Yamaguchi, Yuichiro Mitani, Ryosuke Iijima, Katsuyuki Sekine, Mariko Takayanagi, Kazuhiro Eguchi, Noburu Fukushima (1.Advanced LSI Technology Laboratory, Corporate R&D Center, 2.Semiconductor Company, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2005.A-2-3