[A-2-3] Influences of initial bulk traps on Negative Bias Temperature Instability of HfSiON

Izumi Hirano、Takeshi Yamaguchi、Yuichiro Mitani、Ryosuke Iijima、Katsuyuki Sekine、Mariko Takayanagi、Kazuhiro Eguchi、Noburu Fukushima (1.Advanced LSI Technology Laboratory, Corporate R&D Center、2.Semiconductor Company, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2005.A-2-3