Dielectric Constant Behavior of Hf-O-N System

Tsunehiro Ino; Yuuichi Kamimuta; Masamichi Suzuki; Masato Koyama; Akira Nishiyama

doi:https://doi.org/10.7567/SSDM.2005.A-3-1

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜 2005年9月15日
International Conference Center Kobe, Kobe, Japan

[A-3-1] Dielectric Constant Behavior of Hf-O-N System

Tsunehiro Ino、Yuuichi Kamimuta、Masamichi Suzuki、Masato Koyama、Akira Nishiyama (1.Advanced LSI Technology Laboratory, Corporate Research and Development Center, TOSHIBA Corporation)

https://doi.org/10.7567/SSDM.2005.A-3-1

▲