[A-3-3] Thermal Stability Improvements for HfO2 by Fluorine Implantation

Chao Sung Lai, Woei Cherng Wu, Jer Chyi Wang, Tian Sheng Chao (1.Department of Electronic Engineering, Chang Gung University, 2.Department of Electronic Physics, National Chiao Tung University, 3.Nanya Technology Corporation)

https://doi.org/10.7567/SSDM.2005.A-3-3