Thermal Stability Improvements for HfO2 by Fluorine Implantation

Chao Sung Lai; Woei Cherng Wu; Jer Chyi Wang; Tian Sheng Chao

doi:https://doi.org/10.7567/SSDM.2005.A-3-3

2005 International Conference on Solid State Devices and Materials

2005年9月12日〜 2005年9月15日
International Conference Center Kobe, Kobe, Japan

[A-3-3] Thermal Stability Improvements for HfO2 by Fluorine Implantation

Chao Sung Lai、Woei Cherng Wu、Jer Chyi Wang、Tian Sheng Chao (1.Department of Electronic Engineering, Chang Gung University、2.Department of Electronic Physics, National Chiao Tung University、3.Nanya Technology Corporation)

https://doi.org/10.7567/SSDM.2005.A-3-3

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