[A-4-4] Characterization of Novel HfTiO Gate Dielectrics Post-treated by NH3 Plasma and Ultra-violet Rays

Jer Chyi Wang、Woei Cherng Wu、Chao Sung Lai、Jam Wem Lee、Kuo Cheng Chiang、De Ching Shie、Tan Fu Lei、Chung Len Lee (1.Nanya Technology Corporation、2.Department of Electronic Physics, National Chiao Tung University、3.Department of Electronics Engineering, Chang Gung University、4.National Nano Device Laboratories、5.Department of Electronics Engineering, National Chiao Tung University)

https://doi.org/10.7567/SSDM.2005.A-4-4